A simple electron-beam lithography system

Kristian Mølhave; Dorte Nørgaard Madsen; Peter Bøggild

doi:10.1016/j.ultramic.2004.09.011

A simple electron-beam lithography system

Authors:

Mølhave, Kristian ;
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0000-0002-6493-2750
Department of Micro- and Nanotechnology, Technical University of Denmark
Madsen, Dorte Nørgaard ;
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Department of Micro- and Nanotechnology, Technical University of Denmark
Bøggild, Peter
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Department of Micro- and Nanotechnology, Technical University of Denmark

DOI:

10.1016/j.ultramic.2004.09.011

Abstract:

A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard SEM systems. The tested setup allows an area of up to about 50 x 50 pm to be scanned, if the upper limit for acceptable reduction of the SEM resolution is set to 10 run. We demonstrate how the EBL system can be used to write three-dimensional nanostructures by electron-beam deposition. (C) 2004 Elsevier B.V. All rights reserved.

Type:

Journal article

Language:

English

Published in:

Ultramicroscopy, 2005, Vol 102, Issue 3, p. 215-219

Keywords:

; e-Beam lithography; electron optics; SEM; electron-beam deposition; electron-beam-induced deposition

Main Research Area:

Science/technology

Submission year:

2005

ID:

9517651

A simple electron-beam lithography system

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