- Authors:
- DOI:
- 10.1016/j.ultramic.2004.09.011
- Abstract:
- A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard SEM systems. The tested setup allows an area of up to about 50 x 50 pm to be scanned, if the upper limit for acceptable reduction of the SEM resolution is set to 10 run. We demonstrate how the EBL system can be used to write three-dimensional nanostructures by electron-beam deposition. (C) 2004 Elsevier B.V. All rights reserved.
- Type:
- Journal article
- Language:
- English
- Published in:
- Ultramicroscopy, 2005, Vol 102, Issue 3, p. 215-219
- Keywords:
- ; e-Beam lithography; electron optics; SEM; electron-beam deposition; electron-beam-induced deposition
- Main Research Area:
- Science/technology
- Publication Status:
- Published
- Review type:
- Peer Review
- Submission year:
- 2005
- Scientific Level:
- Scientific
- ID:
- 9517651
0000-0002-6493-2750
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