1 Risø National Laboratory for Sustainable Energy, Technical University of Denmark2 Lab-on-a-Chip, Department of Micro- and Nanotechnology, Technical University of Denmark3 Department of Micro- and Nanotechnology, Technical University of Denmark4 unknown5 Department of Photonics Engineering, Technical University of Denmark
The fabrication of a three-dimensional multilayered nanostructure is demonstrated with a newly developed nanofabrication technique, namely, reverse contact ultraviolet nanoimprint lithography. This technique is a combination of reverse nanoimprint lithography and contact ultraviolet lithography. In this process, a UV cross-linkable polymer and a thermoplastic polymer are spin coated onto a patterned hybrid metal-quartz stamp. These thin polymer films are then transferred from the stamp to the substrate by contact at a suitable temperature and pressure. The whole assembly is then exposed to UV light. After separation of the stamp and the substrate, the unexposed polymer areas are rinsed away with acetone leaving behind the negative features of the original stamp with no residual layer.
Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures, 2006, Vol 24, Issue 6, p. 3002-3005