Efficient nanoscale patterning of large areas is required for sub-wavelength optics. For example, 200 nm periodic structures are often too small to be made with standard UV- and DUV-equipment. Still, the final product must be made at an economic cost. Here we use a fast-writing strategy described in , where electron beam lithography (EBL) with a focused Gaussian beam is used to define shapes directly. The serial technique is optimized for speed and pattern fidelity to a maximum writing speed of around 30 min/cm2 for 200 nm periods in 2D lattices. The overall costs in terms of machine time and feasibility are assessed for different topographies and dimensions.
Proceedings of the 39th International Conference on Micro and Nano Engineering, 2013
Electron Beam Lithography; Nanofabrication; Sub-wavelength; Optics
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39th International Conference on Micro and Nano Engineering, 2013