1 Department of Photonics Engineering, Technical University of Denmark2 Diode Lasers and LED Systems, Department of Photonics Engineering, Technical University of Denmark3 Department of Micro- and Nanotechnology, Technical University of Denmark4 Nanoprobes, Department of Micro- and Nanotechnology, Technical University of Denmark
A cost-effective method for fabricating antireflective subwavelength structures on silicon carbide is demonstrated. The nanopatterning is performed in a 2-step process: aluminum deposition and reactive ion etching. The effect, of the deposited aluminum film thickness and the reactive ion etching conditions, on the average surface reflectance and nanostructure landscape have been investigated systematically. The average reflectance of silicon carbide surface is significantly suppressed from 25.4% to 0.05%, under the optimal experimental conditions, in the wavelength range of 390-784 nm. The presence of stochastic nanostructures also changes the wetting properties of silicon carbide surface from hydrophilic (47°) to hydrophobic (108°).
Optical Materials Express, 2013, Vol 3, Issue 8, p. 1119-1126