1 Lab-on-a-Chip, Department of Micro- and Nanotechnology, Technical University of Denmark2 Department of Micro- and Nanotechnology, Technical University of Denmark3 Plasmonics and Metamaterials, Department of Photonics Engineering, Technical University of Denmark4 Nanointegration, Department of Micro- and Nanotechnology, Technical University of Denmark5 Department of Photonics Engineering, Technical University of Denmark6 Center for Nanostructured Graphene, Center, Technical University of Denmark
The authors demonstrate wafer-scale, parallel process fabrication of distributed feedback (DFB) polymer dye lasers by two different nanoimprint techniques: By thermal nanoimprint lithography (TNIL) in polymethyl methacrylate and by combined nanoimprint and photolithography (CNP) in SU-8. In both techniques, a thin film of polymer, doped with rhodamine-6G laser dye, is spin coated onto a Borofloat glass buffer substrate and shaped into a planar waveguide slab with first order DFB surface corrugations forming the laser resonator. When optically pumped at 532 nm, lasing is obtained in the wavelength range between 576 and 607 nm, determined by the grating period. The results, where 13 laser devices are defined across a 10 cm diameter wafer substrate, demonstrate the feasibility of NIL and CNP for parallel wafer-scale fabrication of advanced nanostructured active optical polymer components, with a yield above 95%.
Journal of Vacuum Science and Technology B, 2006, Vol 24, Issue 6, p. 3252-3257