Ouattara, Lassana3; Knutzen, Michael4; Keller, Stephan Urs5; Hansen, M. F.6; Boisen, Anja5
1 Nanoprobes Group, NanoSystemsEngineering Section, Department of Micro- and Nanotechnology, Technical University of Denmark2 NanoSystemsEngineering Section, Department of Micro- and Nanotechnology, Technical University of Denmark3 Department of Micro- and Nanotechnology, Technical University of Denmark4 Department of Management Engineering, Technical University of Denmark5 Center for Intelligent Drug Delivery and Sensing Using Microcontainers and Nanomechanics, Center, Technical University of Denmark6 unknown
We present a new method to define metal electrodes on top of high-aspect-ratio microstructures using standard photolithography equipment and a single chromium mask. A lift-off resist (LOR) layer is implemented in an SU-8 photolithography process to selectively remove metal at the end of the processing. In this way, we have successfully defined metal electrodes on top of 75 mu m high SU-8 microstructures to be used as test structures for the measurement of temperature increase due to inductive heating.
Microelectronic Engineering, 2010, Vol 87, Issue 5-8, p. 1226-1228